Nanyang Nanofabrication Centre


With state-of-the-art nano-fabrication facilities, the Nanyang NanoFabrication Center (N2FC) provides university wide support for nano-science and nanotechnology research and education. N2FC comprises two cleanrooms (Cleanrooms 1 & 2) and one lab for material growth (MOCVD room). 

Cleanroom 1 (CR1) is a class 100 cleanroom with an area of 673 m2. It houses tools for 6 inch CMOS line as well as other tools for Si-based micro- and nano-fabrication. Cleanroom 2 (CR2) is a class 100 and class 10 cleanroom with an area of 693 m2 dedicated for the fabrication of non-Si based micro- and nano-devices. N2FC hosts a range of advanced fabrication equipment such as Metal Organic Chemical Vapor Deposition (MOCVD), electron beam lithography, and ion implanter and other tools for micro- and nano-fabrication. This allows integration of new nano-devices and technologies for advanced ICs and systems.

The core competency of N2FC is the nanotechnology crossing different material platforms for multi-disciplinary research.

An engineer is working in CR1 of N2FC

Different modules in CR2 and sub-fab of N2FC